Macquarie Semiconductor and Technology on behalf of Macquarie Semiconductor and Technology Inc. (MSTI)
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Metal CVD (Chemical Vapor Deposition)
Date of Manufacture:
Currently Configured for: 200mm
Current Equipment Status: Available
Location of Equipment: Haltom City, United States
Available date: Currently Available
Software: B3919
Mainframe: Centura 5200
Robot: Single Blade
Qty 2 - WxZ
Qty 2 - Sprint W
Qty 1 - Multi-Slot Cooldown Chamber
MFCs: 27 Horiba SEC MFCs, 9 Units 1660 MFCs
Upgrades: Power glitch protection
Process Chuck Type/Material: Aluminum
Dry Pumps: Edwards QDP80/QMB250 stack qty 4, Edwards QDP80 qty 2
Heat Exchanger: AMAT Heatex 1
Abatement: Qty 2 - Delatech CDO Abatement
The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.
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