Macquarie Semiconductor and Technology on behalf of Micron Technology Taiwan, Inc. (F11)

    LAM Research 2300 Versys Metal H

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    Asset ID: 222746

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    LAM Research

    2300 Versys Metal H

    Metal Etch

    Etch/Ash/Clean - Plasma Processing

    Equipment details:

    Date of Manufacture:

    Currently Configured for: 300mm

    Current Equipment Status: Available

    Asset HDD not included

    Location of Equipment: Taoyuan, Taiwan

    Available date: Currently Available


    Included on tool sales 

    FI

    MF

    Chamber- Strip

    Chamber- Strip

    Power Rack

    RPDB

    Load port

    Gas up frame

    Accessary parts

    Ladder


    original PM2, PM3 process metal chamber, chamber RF Cart, Gas Box have transferred to other site, not included on tool sales

    Damage/Missing parts list

    Please inspect tool to reconfirm

    Dry pumps and customer provided items not included on sales

    Product images

    The information referenced on this page is accurate to the best of our knowledge. We do not warrant the completeness or accuracy of the information contained herein. Interested parties are encouraged to request inspection to verify equipment condition, configuration, and completeness. Any offer to purchase equipment shall be subject to our standard terms and conditions of sale.


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